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| A method of depositing high quality, state-of-the-art thin films of single or multiple layers on a substrate using a radio-frequency excited ion beam gun.Ion Beam deposition formation thin films substrates unique relative vacuum produces bulk applied based radio frequency excited ions impinging target Sputtered-off molecules deposited chamber automated unattended operation beam sputter material nearly-bulk density refractive indices resistivity magnetic behaviour growing film/substrate isolated plasma eliminates bombardment actual sputtering limited arriving energy sputtered independently manipulated depending requirements application films/substrate exposed fields heat flexibilty characteristics |
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