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Electron beam treatment of siloxane resins

Electron beam cured siloxane dielectric films and to a process for their manufacture which are useful in the production of integrated circuits. A siloxane polymer having in one aspect less than 40 Mole percent carbon containing substituents, and in another aspect at least approximately 40 Mole percent carbon containing substituents is cured by a wide beam electron beam exposure.

Patent Information

NumberUS  6177143
CountryUS
StatusIssued
Date01/23/2001


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