|
The yet2.com global technology marketplace lists intellectual property, technology, and patents for technology transfer, technology licensing, patent licensing and patent sale. As premier technology brokers, yet2.com offers this essential IP marketplace for technology owners, technology seekers, and technology brokers interested in technology acquisition, patent licensing, intellectual property licensing (IP licensing), and intellectual property transfer.
more...
|
| This is an abstract of a technology that is available for sale or license. yet2.com can introduce you confidentially to the owner of this technology. |
| To view the complete TechPak, please register with us. |
 |
| Enter a keyword or phrase below, and search now to find other technologies of interest. |
|
|
|
|
 |
| Optical Wave Surfer is our epoch-making technology that addresses ellipsometry – a method to analyze the physical properties of media, medium surfaces, and thin films based on the changes in phase differences of electromagnetic waves, including light waves. The technology enables absolute measurement, which was impossible with ellipsometry in the past, and has improved precision greatly. Ellipsometry is a method of detecting status changes of media, medium surfaces and thin films. It features high sensitivity., In the past, however, it was impossible to completely eliminate the influence of incompleteness in the 1/4 wavelength plate (l/4 plate) used for measurement. For this reason, measurement values could only be relative; they varied with the device. Our technology allows the phase differences of wavelength plates, including l/4 plates, to be determined at high precision without use of a reference element. This frees the technology of measurement errors resulting from plate incompleteness . Therefore, the technology provides ellipsometry with absolute measurement, an additional advantage over its high sensitivity. The advantage expands the application of ellipsometry to a range of measurements that require absoluteness, including of the ability to monitor characteristics of gate oxide films in the order of 10 nm. The advantage also improves measurement precision in a variety of applications – ellipsometric analysis of media in the biomedical field, measurement of birefringence of optical materials, and measurement of characteristics of phase difference plates. The figure on the right shows the thickness of a thin, thermally grown silicon oxide film measured with an ellipsometer based on the technology and compares it with the thickness measured with an XPS. Ellipsometer values are plotted along the horizontal axis and the XPS values on the vertical axis. With XPS, the measured values are accurate but the measurement is cumbersome. Our technology allows theend Promotional Description |
|
|
 |
|
Interested? This is an abstract of a technology that is available for sale or license. yet2.com can introduce you confidentially to the owner of this technology.
|
|
To view the complete TechPak, please register with us.
|
 |
|
|