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| This technology targets changing the wettability of liquid on the surface merely through heat applied by laser beam irradiation, and to make wettability reversible. This technology is especially suitable for meeting requirements to produce direct and delicate patterning with ease. This becomes possible because laser beam scanning on the patterning medium, on its own, can draw patterns with differing wettability on the patterning medium. Beyond that, after drawing, the addition of electro conductive ink or light masking ink to the patterning medium makes it possible to produce wiring patterns and optical filters. And that's not all. No masking is necessary. Materials are inexpensive and composition of the patterning medium is simple. Nevertheless, high resolution is possible with pattern widths as narrow as 10μm. Although sensitivity may fall behind that of patterning in the optical mode, it allows work in a lighted room. Another characteristic is that no post processing is required after pattern drawing. Practical applications include CTP plating, Optical Filter, FPC board, DNA chips, and MEMS chips. And this technology is supported by some patents of course. Photo: 'The dot pattern of the light masking ink ' |
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Interested? This is an abstract of a technology that is available for sale or license. yet2.com can introduce you confidentially to the owner of this technology.
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