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| The present invention relates to an optical micro-machining method of glass. According to the technology developed in this invention, a diffraction grating and an optical waveguide can be formed within a short time by the present method. Moreover this method allows to conduct fine patterning when the surface of oxide glass is subjected to light irradiation and then etching.Hereinafter examples present further clearly represent features glass thin film 50 mol GeO2and SiO2and thickness 620 ANG (angstrom) deposited monocrystal silicon substrate sputtering condition composition atmospheric gas 3% oxygen 97% argon flow cc/min pressure inside chamber 10sup-2 torrs analyzed X-ray photoelectron spectroscopy confirmed diffraction amorphous 600 pulses light wavelength 193 nm energy density mJ/cm2 |
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