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| Many different gaseous fluorinated compounds are used in the semiconductor manufacturing industry as “electronic gases” for either etching or cleaning. Impurities even at the part-per-million level in these materials can result in high defect rates in the production of high-density integrated circuits. Nitrogen trifluoride is strongly preferred for some applications. One of the methods of manufacturing NF3 results in the formation of tetrafluoromethane, PFC-14, as an impurity. Separation of NF3 and PFC-14 by conventional distillation is very difficult, if not impossible. DuPont has developed innovative and novel extractive distillation technology for the purification of NF3. This innovative technology resolves the problems associated with purifying NF3 by conventional distillation technology. By using an entraining agent, the relative volatilities of the components in a mixture of NF3 containing PFC-14 can be altered to permit separation. This technology can be fully integrated into a NF3 manufacturing unit or operated as a stand alone facility for purifying low grade NF3 up to commercially acceptable quality of five 9's purity.Nitrogen Trifluoride variety |
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