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| This one-step laser etching process proves advantageous for the micro-fabrication of optics, electromechanical systems, and fluidics. Utilizing a laser-absorbing fluid against the “back” side of virtually any solid, transparent material, any of a number of lasers can perform micro-etching of 1-millimicron to 10-millimicrons. Etching can employ two or more lasers on transparent plates, cylinders, rods, films, vessels, or blocks. This technique performs at room temperature and ambient pressure to accommodate mass-production. The resulting etched design may resemble hatching, a grid array, a bubble array, or any special design. Variations to laser intensity, pulse-rate, and the absorbing liquid, result in predictable depths of etched channels. The use of masks or stencils further enhances control of replicable patterns. This is an exciting advancement in the field of laser micro-etching.Efficient accurate micro-etching long proved tedious unsuited mass production Conventional shown themselves time-consuming expensive even small-quantity replication Micro-fabrication AISTs breakthrough dubbed Laser-Induced Backside Wet Etching (LIBWE) low-energy laser beams single-step wet |
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